Ion beam polishing is a complementary polishing method used to further improve the polishing accuracy of glass workpieces after conventional polishing. First in a vacuum (1.33 Pa) conditions, the inert gas (argon, krypton, xenon, etc.) atoms using high-frequency or discharge method to make ions, and then accelerated with a voltage of 20 ~ 25kV, and then collided into the vacuum chamber located in the 1.33 × 10 Pa vacuum degree of the surface of the workpiece to be processed, the energy directly to the workpiece material atoms, so that it escapes from the surface and is removed. This method can make the workpiece to remove the thickness of 10 ~ 20μm, is typical of the physical collision method of polishing technology, under normal circumstances, the surface roughness of up to 0.01μm, high precision up to 0.6nm.

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